Автор туралы ақпарат

Чесноков, И. А.

Шығарылым	Бөлім	Атауы	Файл
Том 53, № 4 (2024)	TECHNOLOGIES	Plasmochemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium
Том 53, № 3 (2024)	DIAGNOSTICS	Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
Том 52, № 6 (2023)	DIAGNOSTICS	PROBE AND SPECTRAL DIAGNOSTICS OF PLASMA GAS ENVIRONMENT: BCl3-Cl2
Том 52, № 5 (2023)	DIAGNOSTICS	Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane
Том 52, № 1 (2023)	DIAGNOSTICS	Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy
Том 52, № 1 (2023)	DIAGNOSTICS	Электрофизические характеристики и эмиссионные спектры плазмы тетрафторметана