作者的详细信息

Чесноков, И. А.

期	栏目	标题	文件
卷 53, 编号 4 (2024)	TECHNOLOGIES	Plasmochemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium
卷 53, 编号 3 (2024)	DIAGNOSTICS	Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
卷 52, 编号 6 (2023)	DIAGNOSTICS	PROBE AND SPECTRAL DIAGNOSTICS OF PLASMA GAS ENVIRONMENT: BCl3-Cl2
卷 52, 编号 5 (2023)	DIAGNOSTICS	Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane
卷 52, 编号 1 (2023)	DIAGNOSTICS	Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy
卷 52, 编号 1 (2023)	DIAGNOSTICS	Электрофизические характеристики и эмиссионные спектры плазмы тетрафторметана